JPH0115866B2 - - Google Patents

Info

Publication number
JPH0115866B2
JPH0115866B2 JP55049236A JP4923680A JPH0115866B2 JP H0115866 B2 JPH0115866 B2 JP H0115866B2 JP 55049236 A JP55049236 A JP 55049236A JP 4923680 A JP4923680 A JP 4923680A JP H0115866 B2 JPH0115866 B2 JP H0115866B2
Authority
JP
Japan
Prior art keywords
film
amorphous silicon
hydrogen
layer
resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55049236A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56146142A (en
Inventor
Eiichi Maruyama
Yoshio Ishioka
Yoshinori Imamura
Hirokazu Matsubara
Taiji Shimomoto
Shinkichi Horigome
Morio Taniguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4923680A priority Critical patent/JPS56146142A/ja
Priority to DE8181301671T priority patent/DE3172873D1/de
Priority to US06/254,294 priority patent/US4378417A/en
Priority to EP81301671A priority patent/EP0038221B1/en
Priority to CA000375665A priority patent/CA1153238A/en
Publication of JPS56146142A publication Critical patent/JPS56146142A/ja
Priority to US07/162,312 priority patent/USRE33094E/en
Publication of JPH0115866B2 publication Critical patent/JPH0115866B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02—Charge-receiving layers
    • G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
    • G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
    • G03G5/08214—Silicon-based
    • G03G5/08235—Silicon-based comprising three or four silicon-based layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02—Charge-receiving layers
    • G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
    • G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
    • G03G5/08214—Silicon-based
    • G03G5/08221—Silicon-based comprising one or two silicon based layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Light Receiving Elements (AREA)
JP4923680A 1980-04-16 1980-04-16 Electrophotographic sensitive film Granted JPS56146142A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP4923680A JPS56146142A (en) 1980-04-16 1980-04-16 Electrophotographic sensitive film
DE8181301671T DE3172873D1 (en) 1980-04-16 1981-04-15 Electrophotographic member
US06/254,294 US4378417A (en) 1980-04-16 1981-04-15 Electrophotographic member with α-Si layers
EP81301671A EP0038221B1 (en) 1980-04-16 1981-04-15 Electrophotographic member
CA000375665A CA1153238A (en) 1980-04-16 1981-04-16 Electrophotographic member with an amorphous silicon layer containing hidrogen
US07/162,312 USRE33094E (en) 1980-04-16 1986-09-11 Electrophotographic member with alpha-si layers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4923680A JPS56146142A (en) 1980-04-16 1980-04-16 Electrophotographic sensitive film

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP62086854A Division JPS632070A (ja) 1987-04-10 1987-04-10 電子写真感光膜

Publications (2)

Publication Number Publication Date
JPS56146142A JPS56146142A (en) 1981-11-13
JPH0115866B2 true JPH0115866B2 (en]) 1989-03-20

Family

ID=12825247

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4923680A Granted JPS56146142A (en) 1980-04-16 1980-04-16 Electrophotographic sensitive film

Country Status (5)

Country Link
US (2) US4378417A (en])
EP (1) EP0038221B1 (en])
JP (1) JPS56146142A (en])
CA (1) CA1153238A (en])
DE (1) DE3172873D1 (en])

Families Citing this family (67)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4484809B1 (en) * 1977-12-05 1995-04-18 Plasma Physics Corp Glow discharge method and apparatus and photoreceptor devices made therewith
JPS56150752A (en) * 1980-04-25 1981-11-21 Hitachi Ltd Electrophotographic sensitive film
JPS5717952A (en) * 1980-07-09 1982-01-29 Oki Electric Ind Co Ltd Electrophotographic receptor
JPS5723544U (en]) * 1980-07-09 1982-02-06
JPS5727263A (en) * 1980-07-28 1982-02-13 Hitachi Ltd Electrophotographic photosensitive film
JPS5744154A (en) * 1980-08-29 1982-03-12 Canon Inc Electrophotographic image formation member
JPH0629977B2 (ja) * 1981-06-08 1994-04-20 株式会社半導体エネルギー研究所 電子写真用感光体
US4569719A (en) * 1981-07-17 1986-02-11 Plasma Physics Corporation Glow discharge method and apparatus and photoreceptor devices made therewith
JPS5821257A (ja) * 1981-07-30 1983-02-08 Seiko Epson Corp 電子写真感光体の製造方法
JPS5888753A (ja) * 1981-11-24 1983-05-26 Oki Electric Ind Co Ltd 電子写真感光体
GB2115570B (en) * 1981-12-28 1985-07-10 Canon Kk Photoconductive member
US4522905A (en) * 1982-02-04 1985-06-11 Canon Kk Amorphous silicon photoconductive member with interface and rectifying layers
US4452874A (en) * 1982-02-08 1984-06-05 Canon Kabushiki Kaisha Photoconductive member with multiple amorphous Si layers
US4452875A (en) * 1982-02-15 1984-06-05 Canon Kabushiki Kaisha Amorphous photoconductive member with α-Si interlayers
US4490450A (en) * 1982-03-31 1984-12-25 Canon Kabushiki Kaisha Photoconductive member
US4517269A (en) * 1982-04-27 1985-05-14 Canon Kabushiki Kaisha Photoconductive member
JPS5934675A (ja) * 1982-08-23 1984-02-25 Hitachi Ltd 受光素子
NL8204056A (nl) * 1982-10-21 1984-05-16 Oce Nederland Bv Fotogeleidend element voor toepassing in elektrofotografische kopieerprocessen.
JPS59149371A (ja) * 1983-02-16 1984-08-27 Hitachi Ltd 受光面
JPS59231879A (ja) * 1983-06-13 1984-12-26 Matsushita Electric Ind Co Ltd 光導電体およびその製造方法
JPS6011849A (ja) * 1983-06-21 1985-01-22 Sanyo Electric Co Ltd 静電潜像担持体
DE3429899A1 (de) * 1983-08-16 1985-03-07 Canon K.K., Tokio/Tokyo Verfahren zur bildung eines abscheidungsfilms
US4513073A (en) * 1983-08-18 1985-04-23 Minnesota Mining And Manufacturing Company Layered photoconductive element
JPS6045258A (ja) * 1983-08-23 1985-03-11 Sharp Corp 電子写真感光体
JPS6083957A (ja) * 1983-10-13 1985-05-13 Sharp Corp 電子写真感光体
US4544617A (en) * 1983-11-02 1985-10-01 Xerox Corporation Electrophotographic devices containing overcoated amorphous silicon compositions
JPH067270B2 (ja) * 1983-12-16 1994-01-26 株式会社日立製作所 電子写真用感光体
DE3447671A1 (de) * 1983-12-29 1985-07-11 Canon K.K., Tokio/Tokyo Fotoleitfaehiges aufzeichnungsmaterial
JPS60174864A (ja) * 1984-02-15 1985-09-09 Showa Alum Corp 薄膜形成用アルミニウム基材の表面処理方法
DE3506657A1 (de) * 1984-02-28 1985-09-05 Sharp K.K., Osaka Photoleitfaehige vorrichtung
JPH0656498B2 (ja) * 1984-09-26 1994-07-27 コニカ株式会社 感光体及び画像形成方法
US4664999A (en) * 1984-10-16 1987-05-12 Oki Electric Industry Co., Ltd. Method of making electrophotographic member with a-Si photoconductive layer
US4613556A (en) * 1984-10-18 1986-09-23 Xerox Corporation Heterogeneous electrophotographic imaging members of amorphous silicon and silicon oxide
DE3616608A1 (de) * 1985-05-17 1986-11-20 Ricoh Co., Ltd., Tokio/Tokyo Lichtempfindliches material fuer elektrophotographie
US4701395A (en) * 1985-05-20 1987-10-20 Exxon Research And Engineering Company Amorphous photoreceptor with high sensitivity to long wavelengths
US5962869A (en) * 1988-09-28 1999-10-05 Semiconductor Energy Laboratory Co., Ltd. Semiconductor material and method for forming the same and thin film transistor
US5753542A (en) 1985-08-02 1998-05-19 Semiconductor Energy Laboratory Co., Ltd. Method for crystallizing semiconductor material without exposing it to air
US4713309A (en) * 1985-08-26 1987-12-15 Energy Conversion Devices, Inc. Enhancement layer for positively charged electrophotographic devices and method for decreasing charge fatigue through the use of said layer
US4721663A (en) * 1985-08-26 1988-01-26 Energy Conversion Devices, Inc. Enhancement layer for negatively charged electrophotographic devices
JPS62148966A (ja) * 1986-12-02 1987-07-02 Oki Electric Ind Co Ltd 電子写真用感光体
DE3717727A1 (de) * 1987-05-26 1988-12-08 Licentia Gmbh Elektrofotografisches aufzeichnungsmaterial und verfahren zu seiner herstellung
JP2629223B2 (ja) * 1988-01-07 1997-07-09 富士ゼロックス株式会社 電子写真感光体の製造方法
US4885220A (en) * 1988-05-25 1989-12-05 Xerox Corporation Amorphous silicon carbide electroreceptors
US4992348A (en) * 1988-06-28 1991-02-12 Sharp Kabushiki Kaisha Electrophotographic photosensitive member comprising amorphous silicon
US5239397A (en) * 1989-10-12 1993-08-24 Sharp Kabushiki Liquid crystal light valve with amorphous silicon photoconductor of amorphous silicon and hydrogen or a halogen
US5210050A (en) * 1990-10-15 1993-05-11 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing a semiconductor device comprising a semiconductor film
US7115902B1 (en) 1990-11-20 2006-10-03 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and method for manufacturing the same
KR950013784B1 (ko) 1990-11-20 1995-11-16 가부시키가이샤 한도오따이 에네루기 겐큐쇼 반도체 전계효과 트랜지스터 및 그 제조방법과 박막트랜지스터
US5849601A (en) 1990-12-25 1998-12-15 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and method for manufacturing the same
US8106867B2 (en) 1990-11-26 2012-01-31 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and driving method for the same
KR950001360B1 (ko) * 1990-11-26 1995-02-17 가부시키가이샤 한도오따이 에네루기 겐큐쇼 전기 광학장치와 그 구동방법
US7154147B1 (en) 1990-11-26 2006-12-26 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and driving method for the same
US7576360B2 (en) * 1990-12-25 2009-08-18 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device which comprises thin film transistors and method for manufacturing the same
US7098479B1 (en) 1990-12-25 2006-08-29 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and method for manufacturing the same
EP0499979A3 (en) 1991-02-16 1993-06-09 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device
JP2794499B2 (ja) 1991-03-26 1998-09-03 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP2845303B2 (ja) * 1991-08-23 1999-01-13 株式会社 半導体エネルギー研究所 半導体装置とその作製方法
US6693681B1 (en) 1992-04-28 2004-02-17 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and method of driving the same
JP2814161B2 (ja) 1992-04-28 1998-10-22 株式会社半導体エネルギー研究所 アクティブマトリクス表示装置およびその駆動方法
JPH07120953A (ja) * 1993-10-25 1995-05-12 Fuji Xerox Co Ltd 電子写真感光体およびそれを用いた画像形成方法
US7081938B1 (en) * 1993-12-03 2006-07-25 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and method for manufacturing the same
JP2900229B2 (ja) 1994-12-27 1999-06-02 株式会社半導体エネルギー研究所 半導体装置およびその作製方法および電気光学装置
US5834327A (en) * 1995-03-18 1998-11-10 Semiconductor Energy Laboratory Co., Ltd. Method for producing display device
US20040135209A1 (en) * 2002-02-05 2004-07-15 Tzu-Chiang Hsieh Camera with MOS or CMOS sensor array
US20130341623A1 (en) * 2012-06-20 2013-12-26 International Business Machines Corporation Photoreceptor with improved blocking layer
CN114901725B (zh) 2019-12-17 2023-09-08 美国陶氏有机硅公司 聚二有机硅氧烷制备
CA3162641C (en) 2019-12-23 2023-02-14 Maude DESROCHES Sealant composition

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2746967C2 (de) * 1977-10-19 1981-09-24 Siemens AG, 1000 Berlin und 8000 München Elektrofotographische Aufzeichnungstrommel
US4265991A (en) * 1977-12-22 1981-05-05 Canon Kabushiki Kaisha Electrophotographic photosensitive member and process for production thereof
DE2954551C2 (en]) * 1978-03-03 1989-02-09 Canon K.K., Tokio/Tokyo, Jp
US4217374A (en) * 1978-03-08 1980-08-12 Energy Conversion Devices, Inc. Amorphous semiconductors equivalent to crystalline semiconductors
JPS554040A (en) * 1978-06-26 1980-01-12 Hitachi Ltd Photoconductive material
JPS55127561A (en) * 1979-03-26 1980-10-02 Canon Inc Image forming member for electrophotography
JPS58189643A (ja) * 1982-03-31 1983-11-05 Minolta Camera Co Ltd 感光体

Also Published As

Publication number Publication date
JPS56146142A (en) 1981-11-13
US4378417A (en) 1983-03-29
DE3172873D1 (en) 1985-12-19
EP0038221A3 (en) 1982-02-03
EP0038221B1 (en) 1985-11-13
EP0038221A2 (en) 1981-10-21
CA1153238A (en) 1983-09-06
USRE33094E (en) 1989-10-17

Similar Documents

Publication Publication Date Title
JPH0115866B2 (en])
CA1152802A (en) Electrophotographic member including a layer of amorphous silicon containing hydrogen
JPH0115867B2 (en])
US4737428A (en) Image forming process for electrophotography
JPS58192044A (ja) 感光体
JPS62115456A (ja) 電子写真感光体
JPS62115457A (ja) 電子写真感光体
JP2003337437A (ja) 負帯電用電子写真感光体およびそれを用いた電子写真装置
WO1985002691A1 (en) Photosensitive member for electrophotography
JPS6410068B2 (en])
JPH0117144B2 (en])
JPH0117145B2 (en])
US4762761A (en) Electrophotographic photosensitive member and the method of manufacturing the same comprises micro-crystalline silicon
JPH0740138B2 (ja) 電子写真感光体
JPS59149371A (ja) 受光面
JPS62151857A (ja) 光導電部材
JP2532829B2 (ja) 光受容部材
JP2756570B2 (ja) 電子写真感光体
JPS62115460A (ja) 電子写真感光体
JPS63135954A (ja) 電子写真感光体
JPH0454941B2 (en])
JPS6357782B2 (en])
JPS6299759A (ja) 電子写真感光体
JPS62115459A (ja) 電子写真感光体
JPS62115458A (ja) 電子写真感光体